Calibration and Optimization of Near-Field Scanning Microwave Microscope
Examensarbete för masterexamen
Please use this identifier to cite or link to this item:
There are no files associated with this item.
Bibliographical item details
|Type: ||Examensarbete för masterexamen|
|Title: ||Calibration and Optimization of Near-Field Scanning Microwave Microscope|
|Authors: ||Adamyan, Astghik|
|Abstract: ||The focus in this master thesis project was to calibrate the near field scanning microwave microscope (NSMM) and find its sensitivity to dissipation. For this purpose NSMM performance was modeled and flat gold samples embedded with superconductive niobium films were fabricated, first with e- beam lithography and then with photolithography. Atomic Force Microscope (AFM) characterization showed that our fabrication method of flat gold allows to get RMS roughness of less than 1nm, essential factor to eliminate topography effect from microwave contrast. NSMM scanning of the sample fabricated with e-beam lithography showed microwave contrast after cooling down due to proximity effect, while the sample fabricated with photolithography did not show same kind of contrast. After making sure that this sample is superconductive with DC measurement, a test setup was prepared to enhance NSMM sensitivity.|
|Keywords: ||Fysik;Den kondenserade materiens fysik;Nanovetenskap och nanoteknik;Physical Sciences;Condensed Matter Physics;Nanoscience & Nanotechnology|
|Issue Date: ||2011|
|Publisher: ||Chalmers tekniska högskola / Institutionen för mikroteknologi och nanovetenskap|
Chalmers University of Technology / Department of Microtechnology and Nanoscience
|Collection:||Examensarbeten för masterexamen // Master Theses|
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.