Substrate preparation for optimized growth of vertically aligned carbon nanofibers

dc.contributor.author	Xiaohui, Cao
dc.contributor.department	Chalmers tekniska högskola / Institutionen för mikroteknologi och nanovetenskap	sv
dc.contributor.department	Chalmers University of Technology / Department of Microtechnology and Nanoscience	en
dc.date.accessioned	2019-07-03T12:34:40Z
dc.date.available	2019-07-03T12:34:40Z
dc.date.issued	2010
dc.description.abstract	In order to explore the optimal growth condition of carbon nanofibers on patterned metal on isolating substrate, we employ colloidal lithography to realize the mass production of test chips. We achieve these catalyst dots with short-range ordering, which are semi-quantitatively characterized by SEM and a radial distribution function. In addition, we explore the relation between the deposition conditions and the resistivities of TiN films coming out of our sputtering machine.
dc.identifier.uri	https://hdl.handle.net/20.500.12380/140334
dc.language.iso	eng
dc.setspec.uppsok	PhysicsChemistryMaths
dc.subject	Materialvetenskap
dc.subject	Nanovetenskap och nanoteknik
dc.subject	Elektrofysik
dc.subject	Övrig teknisk materialvetenskap
dc.subject	Materials Science
dc.subject	Nanoscience & Nanotechnology
dc.subject	Electrophysics
dc.subject	Other materials science
dc.title	Substrate preparation for optimized growth of vertically aligned carbon nanofibers
dc.type.degree	Examensarbete för masterexamen	sv
dc.type.degree	Master Thesis	en
dc.type.uppsok	H

Visar 1 - 1 av 1