Effect of porosity on mechanical and fracture properties of Advanced PECVD Ultralow-k SiCOH films

dc.contributor.authorWu, Chen
dc.contributor.departmentChalmers tekniska högskola / Institutionen för mikroteknologi och nanovetenskapsv
dc.contributor.departmentChalmers University of Technology / Department of Microtechnology and Nanoscienceen
dc.date.accessioned2019-07-03T13:02:41Z
dc.date.available2019-07-03T13:02:41Z
dc.date.issued2012
dc.identifier.urihttps://hdl.handle.net/20.500.12380/166082
dc.language.isoeng
dc.setspec.uppsokPhysicsChemistryMaths
dc.subjectElektroteknik och elektronik
dc.subjectMaterialvetenskap
dc.subjectNanovetenskap och nanoteknik
dc.subjectProduktion
dc.subjectElectrical Engineering, Electronic Engineering, Information Engineering
dc.subjectMaterials Science
dc.subjectNanoscience & Nanotechnology
dc.subjectProduction
dc.titleEffect of porosity on mechanical and fracture properties of Advanced PECVD Ultralow-k SiCOH films
dc.type.degreeExamensarbete för masterexamensv
dc.type.degreeMaster Thesisen
dc.type.uppsokH
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