Effect of porosity on mechanical and fracture properties of Advanced PECVD Ultralow-k SiCOH films
dc.contributor.author | Wu, Chen | |
dc.contributor.department | Chalmers tekniska högskola / Institutionen för mikroteknologi och nanovetenskap | sv |
dc.contributor.department | Chalmers University of Technology / Department of Microtechnology and Nanoscience | en |
dc.date.accessioned | 2019-07-03T13:02:41Z | |
dc.date.available | 2019-07-03T13:02:41Z | |
dc.date.issued | 2012 | |
dc.identifier.uri | https://hdl.handle.net/20.500.12380/166082 | |
dc.language.iso | eng | |
dc.setspec.uppsok | PhysicsChemistryMaths | |
dc.subject | Elektroteknik och elektronik | |
dc.subject | Materialvetenskap | |
dc.subject | Nanovetenskap och nanoteknik | |
dc.subject | Produktion | |
dc.subject | Electrical Engineering, Electronic Engineering, Information Engineering | |
dc.subject | Materials Science | |
dc.subject | Nanoscience & Nanotechnology | |
dc.subject | Production | |
dc.title | Effect of porosity on mechanical and fracture properties of Advanced PECVD Ultralow-k SiCOH films | |
dc.type.degree | Examensarbete för masterexamen | sv |
dc.type.degree | Master Thesis | en |
dc.type.uppsok | H |